| After-sales Service: | Engineers Can Be Sent to The Worksite |
|---|---|
| Warranty: | 1 Year |
| Type: | Coating Production Line |
| Coating: | Vacuum Coating |
| Substrate: | Aluminum |
| Certification: | CE |
| Customization: |
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Audited Supplier Physical Vapor Deposition (PVD) Processes Sputtering Thin Film Deposition Equipment
SPUTTER DEPOSITION
Sputter deposition, otherwise known as sputtering, is the process where the material is not thermally vaporized and the atoms are physically redirected from the source material to the substrate by collision from a bombarding particle. The distant from the source to the substrate is much shorter than that of vacuum deposition. Sputter can also be done under a higher plasma pressure of 5-20 mTorr and the material is heated by collisions with gas molecules. The sputtering source itself can be made of elements, alloys, mixtures, or compounds. Titanium Nitride (TiN) and Zirconium Nitride (ZrN) along with some Boron mixed Diamond-like carbon (DLC) are common coatings for this process. This form of deposition is commonly used in semiconductor manufacturing, on architectural glass, reflective coatings, compact discs (CDs), magnetic films, dry film lubricants, and decorative coatings.
DC magnetron sputtering coating machine is usually used for direct sputtering coating for different substrates, such as kinds of plastic, glass, metal, ceramic, etc.
We have dedicated more than 10 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, and can be manufactured in such a way that can fit most magnetron sizes.
Magnetic fields can essentially define the behaviour and the properties of the ion charged particles that are used for sputtering. The development and commercialisation of software that can enable the distinct modelling of magnetron sputtering is bound to enhance its productivity, applicability, and reproducibility.
| Technical Spcifications |
| Model Number | SP-1000 | SP-1200 | SP-1400 | SP-1800 |
| Dimension of vacuum chamber | 1000*1100 | 1200*1400 | 1400*1600 | 1800*2000 |
| (diameter*height) | ||||
| Material of vacuum chamber | Carbon steel, SUS304 or SUS316L | |||
| Quantity of sputtering cathodes | ≥1 sets, DC sputtering system, cylindrical or rectangle sputtering cathodes | |||
| Pumping system | Turbo molecular pumps or diffusion pump+mechanical pump | |||
| Pumping Time | From atmosphere to 5.0*10-2Pa less than 8 minutes | |||
| Gas distribution System with Mass Flow Controllers | ≥2 sets | |||
| Ultimate Vacuum | 5.0*10-4 Pa | |||
| Working temperature | Room temperature | |||
| Working mode | Automatic or Manual mode, by 10.4(or 15) inches PLC touches screen | |||
| Total Power | 40-100kW | 70-1000kW | ||
| These units you can custom made | 1. Size of vacuum chamber | |||
| 2. Quantity of sputtering cathodes | ||||
| 3. Configurations of pumps | ||||
| 4. Gas distribution system | ||||
| Optional instruments | 1. Coatings thickness monitor | |||
| 2. Leakage detector | ||||
| 3. Arc ion deposition system(not for continuous model) | ||||
| 4. Evaporation system(not for continuous model) | ||||
PS: All the specifications can be customized according to your requests.
1. The inner packing is protective plastic film to protect the PVD machine from moisture and rain.
2. The out packing is plywood plate with steel to keep the PVD machine in good condition during the long distance transportation.
After the customer tested the PVD coating machine and make sure the machine is no problem, we will take the machine apart. The solid packing can make sure you will receive a machine without any destroy.
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