| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
High Vacuum Thin Film Nano Technology PVD Coating System
Vacuum magnetron sputtering technique is the use of the female, bipolar electrode surface with the magnetic field of the electron in the cathode surface drift, by setting the target surface electric field perpendicular to the magnetic field, the electron increases stroke, increase the rate of ionization of the gas, while the high-energy particles gas and lose energy after the collision and so lower substrate temperature, complete coating on a non-temperature resistant material. Vacuum magnetron sputtering coating has the following advantages:
(1) The thickness of the coating can be controlled, according to the needs of people plating film, and the coating can be repeated, but also to break the limit of the prior art, to obtain a uniform film thickness on a large surface;
(2) Film obtained by this technique with strong adhesion;
(3) This technique can be prepared a special film material, according to their needs while sputtering hybrid film, compound film;
(4) high purity film.
Both of cathodic arc depsotion and magnetron sputtering coating technologies can be used for the vacuum PVD coating process.
| Model Number | SP-600 | SP-900 | SP-1000 | SP-1200 | SP-1400 | SP-1800 | SP-8000 |
| Dimension of vacuum chamber(diameter*height) | 600*700mm | 900*1000 | 1000*1100 | 1200*1400 | 1400*1600 | 1800*2000 | Continuous line |
| Material of vacuum chamber | Carbon steel, SUS304 or SUS316L | ||||||
| Quantity of sputtering cathodes | ≥1 sets, DC or MF(medium frequency), or rectangle sputtering cathodes | ||||||
| Pumping system | molecular pump or diffusion pump+mechanical pump | molecular pump or diffusion pump+mechanical pumps, booster pump | |||||
| Pumping Time | From atmosphere to 5.0*10-2Pa less than 8 minutes | ||||||
| Gas distribution System with Mass Flow Controllers | ≥2 sets | ||||||
| Vacuum Limit | 5.0*10-4 Pa | ||||||
| Working temperature | Room temperature As requested( for for continuous model) |
||||||
| Working mode | Automatic or Manual mode, by 10.4 inches PLC touches screen | ||||||
| Total Power | 40-100kW | 70-1000kW | |||||
| Footprint | 2*2 meters | 2*3 meters | 3*3 meters | 3*3 meters | 3*4 meters | 4*5 meters | Depends on needs |
| These units you can custom made | 1. Size of vacuum chamber 2. Quantity of sputtering cathodes 3. Configurations of pumps 4. Gas distribution system |
||||||
| Optional instruments | 1. Coatings thickness monitor 2. Leakage detector 3. Arc ion deposition system(not for continuous model) 4. Evaporation system(not for continuous model) |
||||||
){kind=link}