Planar Magnetrons Sputtering Cathodes for PVD Coatings

• Customization: Available
• After-sales Service: Engineers Can Be Sent to The Worksite
• Warranty: 1 Year
• Model NO.: SP-100
• Type: Coating Production Line
• Coating: Vacuum Coating
• Substrate: Steel
• Certification: CE
• Condition: New
• Key Selling Points: Long Service Life
• Weight (Kg): 38
• Power Supply: with or Without DC /Mf Magnetron Power
• Voltage: Customers Local Voltage
• Machinery Test Report: Provided
• Technology: Medium Frequency or DC Sputtering
• Transport Package: Standard Export Packing
• Specification: Customized
• Trademark: Hondson VAC
• Origin: China
• HS Code: 8543309090
• Production Capacity: 200 Sets/Year

Product Description

Planar Magnetrons Sputtering Cathodes for PVD Coatings

Planar Magnetron Sputtering Cathode is an advanced physical vapor deposition (PVD) technology, which is widely used to prepare various thin film materials, such as metals, semiconductors and insulators. Planar magnetron sputtering cathode is an efficient coating equipment, which can increase the sputtering rate by introducing a magnetic field on the surface of the target cathode to improve the plasma density. This design not only improves the coating speed, but also reduces the thermal impact on the substrate, which is suitable for the preparation of high-quality films. 

Name	Planar Magnetrons Sputtering Cathodes for PVD Coatings
Type	Rotary sputtering cathodes
Application	For magnetron sputtering
Size	Customized

Main features 
 1. High efficiency: Planar magnetron sputtering cathode can achieve high-speed, low-temperature, low-damage sputtering process, suitable for large-scale production. 
 2. Versatility: Various target materials (such as Au, Pt, Ag, Pd, etc.) can be used to meet the coating requirements of different materials. 
 3. High uniformity: By optimizing the magnetic field design, uniform film distribution can be achieved and the performance consistency of products can be improved. 
 4. Safety: Full closed-loop vacuum design and real-time monitoring system ensure the safe and stable operation of the equipment. 

Applications:
 Planar magnetron sputtering cathodes are widely used in the following fields: 
 -Semiconductor industry: for the preparation of conductive and insulating layers in integrated circuits. 
 -Optical coating: production of high-performance optical filters and mirrors. 
 -Magnetic materials: preparation of magnetic films, such as CoPt films. 
 -Decorative and protective coatings: provide wear-resistant and corrosion-resistant surface coatings for metal and plastic products.

Technical advantages 
 -High purity: The target materials and reaction gases used in reactive magnetron sputtering are of high purity, which is conducive to the preparation of high-purity compound films. 
 -Precise control: The film properties can be controlled by adjusting the process parameters to prepare films with different chemical ratios. 
 -Large area coating: suitable for the preparation of large area uniform film, suitable for industrial production. 

Customized services 
 Hondson VAC offers customized sputtering cathode designs to meet specific application needs. Whether it is the selection of special targets or special coating processes, we can provide professional technical support and solutions. 

 

 

This sputtering coating unit can be used for PVD sputtering system.

Main Features:
Easy to install design.
High strength rare earth magnet module
Compatibility with DC, pulsed DC, MF operation.
High sputtering rate coupled with excellent target utilization
The sputtering material can be different metals, and silcon
Integrated argon gas inlet assembly.
Optimized turbulent water flow to provide uniform target cooling.
Low operating pressures.
Flexibility to accept target in 'clamp on' or 'bonded' configuration to cover broad range of thicknesses down to foils.
External or internal mounting optional.
UBM option available in all categories.
UHV compatible sources are also available
Integrated shutter assembly.

DC Sputtering

 

 

 

DC magnetron sputtering coating machine is usually used for direct sputtering coating for different substrates, such as kinds of plastic, glass, metal, ceramic, etc.

 

 

We have dedicated more than 10 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, and can be manufactured in such a way that can fit most magnetron sizes.

Magnetic fields can essentially define the behaviour and the properties of the ion charged particles that are used for sputtering. The development and commercialisation of software that can enable the distinct modelling of magnetron sputtering is bound to enhance its productivity, applicability, and reproducibility.

 

 

 

Company Information

 

 

 

 

 

As a manufacturer of PVD coating systems, Hondson VAC responds to your wishes and supply you with a tailor-made system that meets your needs. To improve profitability, we build on our proven cylindrical standard recipients, but any other type of vacuum chamber is also possible. Contact us!