| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
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High Power Impulse Magnetron Sputtering HIPIMS Power Supply for PVD Vacuum Coating Machine
Advanced Features
High peak power output
High ionization fraction of upto 50%
Effective utilization of cathode/target
Easily adaptable to existing cathode and process
Active arc suppression with stable sputtering process
Adjustable pulse duration and frequency
Good stoichiometric film in reactive deposition
Minimum film defect by droplet - free sputtering
Superior film density and extreme structural conformity
Excellent adhesion and decreased roughness
Technical Specifications of the HIPIMS Power Supply:
Output Power : 20kW
Output Mode : DC output, Pulse output and DC superposed
Pulse output for magnetron sputtering
Operation Interface : Touch Screen Control
DC Mode Output : Constant Current
DC Voltage : ~800V
DC Max. Current : 15A
DC Power : 10kW
Pulse Mode Output : Constant Voltage
Maximum Pulse
Output Voltage : ~0 - 1000V
Pulse Power : 10kW
Maximum Pulse
Peak Current : 400A (adjustable set-point to avoid
overcurrent for various target size)
Pulse Width : ~25μs - 300μs (continuous adjustable)
Pulse Frequency : ~25Hz - 300Hz (continuous adjustable)
Arc Suppression : Equipped
Cooling Mode : Forced Air
Protection : over-voltage, over-current, over-heat
Waveform Output : BNC ports for oscilloscope to real-time
measurement of voltage and discharge current
Input Power : AC 380 V ± 5%, 50 Hz ± 5%, 60A, 3-phase 4-wire systems
1. Outside package: Standard marine export polywood case.
2. Inner package: Stretchy film and plastic film for humidity.
3. Wooden box at the bottom of a solid iron socket for easy handling
4. We can package according to your requests.
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