The sputtering line is designed for continuous operation.The continuous linear sputtering system consists of more than 2 vacuum chambers and can be customized according to the client's requirements.
1. Anti-reflective coatings AR glass
2. Aluminum & silver glass mirror
3. ITO conductive glass
4. Titanium nitride golden decorative coatings
5. Low E(Low emissivity) glass
6. Displays or windows or solar panels, etc
Size of glass: Depends on the client's requirements
Size of inline sputtering system: Tailor-made
Target materials: Silicon, Indium tin oxide(ITO)metals such as titanium, chrome, silver, etc
Power source: DC,Pulsed DC or MF, Ion source power supply
Magntron sputtering cathodes type: Planar or Cylindrical rotating magnetron sputtering cathodes
Device operation: Continuous
Type of apparatus: Linear through
Quantity of vacuum sputtering chambers: More than 2 sputtering chambers
Deposition of individual layers: Inert and reactive sputtering deposition coatings
Substrate cleaning: Optional
Measurement of the layer deposition process: Power, current, voltage
Speed of substrate movement by line: Adjustable
Advantages of the inline sputtering system:
1. Large size glass applicable
2. High efficiency and large scale output
3. High film uniformity and stable deposition coatings
4.Continuous working
5.High quality deposition coatings
6.Less labor needed
7.Easy operation