| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 3 Months |
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Rotating Cathode, Cylindrical Tube Target for Coating Machine
This sputtering coating unit can be used for PVD sputtering system.
Main Features:
Easy to install design.
High strength rare earth magnet module
Compatibility with DC, pulsed DC, MF operation.
High sputtering rate coupled with excellent target utilization
The sputtering material can be different metals, and silcon
Integrated argon gas inlet assembly.
Optimized turbulent water flow to provide uniform target cooling.
Low operating pressures.
Flexibility to accept target in 'clamp on' or 'bonded' configuration to cover broad range of thicknesses down to foils.
External or internal mounting optional.
UBM option available in all categories.
UHV compatible sources are also available
Integrated shutter assembly.
DC magnetron sputtering coating machine is usually used for direct sputtering coating for different substrates, such as kinds of plastic, glass, metal, ceramic, etc.
We have dedicated more than 10 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, and can be manufactured in such a way that can fit most magnetron sizes.
Magnetic fields can essentially define the behaviour and the properties of the ion charged particles that are used for sputtering. The development and commercialisation of software that can enable the distinct modelling of magnetron sputtering is bound to enhance its productivity, applicability, and reproducibility.
| Technical Spcifications |
| Model Number | SP-1000 | SP-1200 | SP-1400 | SP-1800 |
| Dimension of vacuum chamber | 1000*1100 | 1200*1400 | 1400*1600 | 1800*2000 |
| (diameter*height) | ||||
| Material of vacuum chamber | Carbon steel, SUS304 or SUS316L | |||
| Quantity of sputtering cathodes | ≥1 sets, DC sputtering system, cylindrical or rectangle sputtering cathodes | |||
| Pumping system | Turbo molecular pumps or diffusion pump+mechanical pump | |||
| Pumping Time | From atmosphere to 5.0*10-2Pa less than 8 minutes | |||
| Gas distribution System with Mass Flow Controllers | ≥2 sets | |||
| Ultimate Vacuum | 5.0*10-4 Pa | |||
| Working temperature | Room temperature | |||
| Working mode | Automatic or Manual mode, by 10.4(or 15) inches PLC touches screen | |||
| Total Power | 40-100kW | 70-1000kW | ||
| These units you can custom made | 1. Size of vacuum chamber | |||
| 2. Quantity of sputtering cathodes | ||||
| 3. Configurations of pumps | ||||
| 4. Gas distribution system | ||||
| Optional instruments | 1. Coatings thickness monitor | |||
| 2. Leakage detector | ||||
| 3. Arc ion deposition system(not for continuous model) | ||||
| 4. Evaporation system(not for continuous model) | ||||
PS: All the specifications can be customized according to your requests.
As a manufacturer of PVD coating systems, Xiangtan Hondson Coating Technology Co., Ltd. responds to your wishes and supply you with a tailor-made system that meets your needs. To improve profitability, we build on our proven cylindrical standard recipients, but any other type of vacuum chamber is also possible. Contact us!
For more details, please contact us.
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