| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
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PVD Vacuum Deposition Inline Sputtering System For Various Applications
Vacuum magnetron sputtering technique is the use of the female, bipolar electrode surface with the magnetic field of the electron in the cathode surface drift, by setting the target surface electric field perpendicular to the magnetic field, the electron increases stroke, increase the rate of ionization of the gas, while the high-energy particles gas and lose energy after the collision and so lower substrate temperature, complete coating on a non-temperature resistant material. Vacuum magnetron sputtering coating has the following advantages:
(1) The thickness of the coating can be controlled, according to the needs of people plating film, and the coating can be repeated, but also to break the limit of the prior art, to obtain a uniform film thickness on a large surface;
(2) Film obtained by this technique with strong adhesion;
(3) This technique can be prepared a special film material, according to their needs while sputtering hybrid film, compound film;
(4) high purity film.
We provide customized options for the machine, such as the different vacuum pumping systems, gas distribution system, coating system, etc.
| Parts Name | Vacuum magnetron sputtering system |
| * Main application | Mirror making; ITO conductive glass, Low-E glass and sun reflecting glass; Solar cells; other thin film coating; Pilot coating engineering. |
| * Custom made(Vertical or Horizontal chamber)working chamber in Rectangular or cylindrical | Single layer or with cooling jacket |
| * Base material of body | Carbon steel or stainless steel |
| * Custom made carousel/rack/jigs | √ |
| * High vacuum system based on oil diffusion pumps or molecular pump/MAG molecular pumps, roots/booser pump and mechanical pumps; | √ |
| * Electrical controlling center with PLC screen, automatic and manual work modes available; | √ |
| * Tungsten&aluminum filament evaporation unit | × |
| * Magnetron sputtering cathodes in Rectangular or cylindrical | √ |
| * Arc deposition unit | × |
| Notice: This is a kind of custom made machine, the three above unit can be united in the same machine for multi-functional applications. | |
| * Power support | Magnetron sputtering source |
| * Gas feeding system | The quantity will be provided according to the needs. |
| * Cool water | For pumps and cathodes, power sources |
| * Compressed air needed | √ |
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