Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes

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Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year
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  • Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
  • Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
  • Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
  • Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
  • Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
  • Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
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Overview

Basic Info.

Model NO.
Non
Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Involved Techniques
Sputtering and Arc Ion Plating
Shape
Tubes or Discs, and Can Be Plates
Size
Cusomized
Powder or Not
Not Powder
Grade
Ti,Tialsi,Tial,Graphite,Zirconium,Cr,Al,Alcrsi,Si
Technique
Forging ,Machining
Ti Content (%)
>99.99%
Application
PVD, CVD, Vacuum Coating
Processing Service
Cutting
Transport Package
Standard Export Packing
Specification
Customized
Trademark
Hondson VAC
Origin
China
HS Code
8543309090
Production Capacity
200 Sets/Year

Product Description

Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes

 

Characteristic

Technique Forging ,Machining
Status Annealed
Type Round target
Surface CNC lathe surface
Certificate SO9001:2015, TUV, SGS ,EN10204.3.1
Application 1. Medical:titanium alloy (Ti6Al4V-ELI F136) and cp titanium (Ti Gr.2 F67) for implants
2. Used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications

 

Specifications:

Specifications Chromium Chrome aluminum Titanium Titanium aluminum
Content 99.99% 99.99% 99.99% 99.99%
Density 7.19cm3/g  customized 4.5cm3/g  customized
Average particle size ≤50μm ≤50μm ≤50μm ≤50μm
Shape (Max or Minimum) Customized customized customized customized
Sintering technology Hot isostatic pressure hot isostatic pressure hot isostatic pressure hot isostatic pressure
Oxygen content ≤150ppm ≤150ppm ≤100ppm ≤100ppm

Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes

Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes

We provide target materials in this type:

Cylindrical Sputtering Target Material Arc Target Material Discs
Titaninum Titaninum
 - TiAlSi
 - TiAl
 - Graphite
Silicon (3mm thickness for the silicon, with
stainless steel core)
 -
 - CrAl
 - Zirconium
Chrome Chrome
Aluminum Aluminum
 - AlCrSi
Packing:
Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes
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Inquiry Guide:

The PVD coating machine can be used for different materials and industries. In order to recommend you the appropriate machine, we need your help on telling us:

What size of target material?

What purity?
Cylindrical Magnetron Sputtering Target for PVD Vacuum Coating Titanium Tube Metal Tubes Raw Materials Coating Cathodes

 

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