Mf Unbalanced Magnetron Sputtering Sources

Product Details
Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year
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  • Mf Unbalanced Magnetron Sputtering Sources
  • Mf Unbalanced Magnetron Sputtering Sources
  • Mf Unbalanced Magnetron Sputtering Sources
  • Mf Unbalanced Magnetron Sputtering Sources
  • Mf Unbalanced Magnetron Sputtering Sources
  • Mf Unbalanced Magnetron Sputtering Sources
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  • Overview
  • MF sputtering
  • Company Information
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
SP-1000
Type
DC/Mf Sputtering Cathode
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Weight (Kg)
38
Size
Customized
Dimension(L*W*H)
Customized Size
Power Supply
with or Without DC /Mf Magnetron Power
Shape of Cathode
Cylindrical or Planar
Key Selling Points
Long Service Life
Technology
Medium Frequency or DC Sputtering
Voltage
Customers Local Voltage
Machinery Test Report
Provided
Equipment Name
Mf Unbalanced Magnetron Sputtering Sources
Machine Type
Magnetron Sputtering Cathode
Common Coatings
Different Kinds of Metal Coatings
Video Outgoing-Inspection
Provided
Applicable Industries
Manufacturing Plant, PVD Coating Service Provider
Application
Used in Sputtering System
Transport Package
Standard Export Packing
Specification
Customized
Trademark
Hondson VAC
Origin
Hunan, China
HS Code
8543300090
Production Capacity
50 Sets/Year

Product Description

MF Unbalanced Magnetron Sputtering Sources

 

 

Mf Unbalanced Magnetron Sputtering Sources

This sputtering coating unit can be used for PVD sputtering system.

Main Features:
Easy to install design.
High strength rare earth magnet module
Compatibility with DC, pulsed DC, MF operation.
High sputtering rate coupled with excellent target utilization
The sputtering material can be different metals, and silcon
Integrated argon gas inlet assembly.
Optimized turbulent water flow to provide uniform target cooling.
Low operating pressures.
Flexibility to accept target in 'clamp on' or 'bonded' configuration to cover broad range of thicknesses down to foils.
External or internal mounting optional.
UBM option available in all categories.
UHV compatible sources are also available
Integrated shutter assembly.

MF sputtering

Mf Unbalanced Magnetron Sputtering Sources

Medium Frequency(MF) Twin Cathodes Magnetron Sputtering

Mf Unbalanced Magnetron Sputtering Sources

 

Unbalanced magnetron sputtering can be come with a cylindrical and planar target. The deposition power efficiency twice as large as that obtained by conventional magnetron sputtering was realized.

 

Mf Unbalanced Magnetron Sputtering Sources

How the sputtering system works

Mf Unbalanced Magnetron Sputtering Sources

 

This technology can be usually used for applying decorative colors onto metal, ceramic and glass items.

 

General Process

 

·         Ar gas which is activated in plasma forms Ar ions.

·         The Ar ions sputter out metal atoms from the target.

·         Unbalanced magnetic field introduces the Ar ions around the substrate.

·         Apply negative voltage on the substrate to attract Ar ions that induce active energy to the metal atoms depositing on the substrate.

·         Solid metal films are formed on the substrate.

 

Techanical Specifications
Model Number SP-1000 SP-1200 SP-1400 SP-1800
Dimension of vacuum chamber 1000*1100 1200*1400 1400*1600 1800*2000
(diameter*height)
Material of vacuum chamber Carbon steel, SUS304 or SUS316L
Quantity of sputtering cathodes ≥1 sets,MF(medium frequency) unbalanced sputtering system, or rectangle or cylindrical sputtering cathodes
Pumping system Turbo molecular pumps or diffusion pump+mechanical pump
Pumping Time From atmosphere to 5.0*10-2Pa  less than 8 minutes
Gas distribution System with Mass Flow Controllers ≥2 sets
Ultimate Vacuum 5.0*10-4 Pa
Working temperature Room temperature
Working mode Automatic or Manual mode, by 10.4(or 15) inches PLC touches screen
Total Power 40-100kW 70-1000kW
These units you can custom made 1. Size of vacuum chamber
2. Quantity of sputtering cathodes
3. Configurations of pumps
4. Gas distribution system
Optional instruments 1. Coatings thickness monitor
2. Leakage detector
3. Arc ion deposition system(not for continuous model)
4. Evaporation system(not for continuous model)

PS: All the specifications can be customized according to your requests.

Different colors made by MF magnetron sputtering

Mf Unbalanced Magnetron Sputtering Sources

Company Information

Xiangtan Hondson Coating Technology Co., Ltd. has enjoyed conspicuous success in the design, manufacture of PVD Vacuum Coating Machines. We are specialized in innovative PVD technology, as well as equipment for various applications, including electronics, thin film deposition, vacuum coated glass, automotive, plastic decorations, harden protective coatings on tools, molds, drills, knives, etc. Our high quality Vacuum Coaters are sold to foreign and domestic markets and win their praise and good graces. We are happy to establish business relationship with customers all over the world. If you are interested in our products, or you are looking for cooperation partners in China for Vacuum Coating Equipment, welcome to contact us for further information. Every machine is designed according to customer's real requests.

Mf Unbalanced Magnetron Sputtering Sources

Mf Unbalanced Magnetron Sputtering Sources

 

Packaging & Shipping

 

Mf Unbalanced Magnetron Sputtering Sources

 

1. The inner packing is protective plastic film to protect the PVD machine from moisture and rain.

2. The out packing is plywood plate with steel to keep the PVD machine in good condition during the long distance transportation.

 

After the customer tested the PVD coating machine and make sure the machine is no problem, we will take the machine apart. The solid packing can make sure you will receive a machine without any destroy.

FAQ

Mf Unbalanced Magnetron Sputtering Sources

For more details, please contact us.

 

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