Circular Planar Cathode for Magnetron Sputtering

Product Details
Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 3 Months
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  • Circular Planar Cathode for Magnetron Sputtering
  • Circular Planar Cathode for Magnetron Sputtering
  • Circular Planar Cathode for Magnetron Sputtering
  • Circular Planar Cathode for Magnetron Sputtering
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Overview

Basic Info.

Model NO.
SP-50
Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Size
Customized
Dimension(L*W*H)
Customized Size
Power Supply
with or Without DC /Mf Magnetron Power
Shape of Cathode
Cylindrical or Planar
Key Selling Points
Long Service Life
Voltage
Customers Local Voltage
Machinery Test Report
Provided
Equipment Name
Circular Planar Cathode for Magnetron Sputtering
Common Coatings
Different Kinds of Metal Coatings
Application
Used in Sputtering System
Transport Package
Standard Export Packing
Specification
Customized
Trademark
Hondson VAC
Origin
Hunan, China
HS Code
8543309090
Production Capacity
200 Sets/Year

Product Description

Magnetron Sputtering Source PVD Magnetron Sputtering Source Vacuum Sputtering Source

Name Magnetron Sputtering Source PVD Magnetron Sputtering Source Vacuum Sputtering Source
Type Planar sputtering cathodes
Application For magnetron sputtering
Size Customized

 

Characteristics of circular cathode design:
1. Water cooling adopts a large cross-sectional direct water cooling structure to shorten the distance between the magnet and the target material;
2. The main bracket is made of PEEK material, which improves the insulation performance;
3. All electrical inlet parts are made of high-purity oxygen free copper material, which reduces the distribution of connection resistance;
4. The magnet is made of high uniformity neodymium iron boron material, which improves the horizontal magnetic field strength and distribution uniformity.
Magnetron sputtering cathode has the following advantages:
1. Suitable for high-power density sputtering with high sputtering rate;
2. The sputtering cathode has a long service life;
3. High utilization rate of target material, reaching over 40%;
4. The thickness uniformity and composition consistency of the sputtered film are good, and can reach within ± 3%.


DC magnetron sputtering coating machine is usually used for direct sputtering coating for different substrates, such as kinds of plastic, glass, metal, ceramic, etc.

We have dedicated more than 16 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, and can be manufactured in such a way that can fit most magnetron sizes.

Magnetic fields can essentially define the behaviour and the properties of the ion charged particles that are used for sputtering. The development and commercialisation of software that can enable the distinct modelling of magnetron sputtering is bound to enhance its productivity, applicability, and reproducibility.

 

 

Company Information

 

Circular Planar Cathode for Magnetron SputteringCircular Planar Cathode for Magnetron Sputtering

As a manufacturer of PVD coating systems, Hondson VAC responds to your wishes and supply you with a tailor-made system that meets your needs. To improve profitability, we build on our proven cylindrical standard recipients, but any other type of vacuum chamber is also possible.

For more details, please contact us.

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