| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
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Thin Film Deposition Silicon Dioxide Sputtering Vacuum Coater PVD Chamber
Material involved: plastic, metal, glass, ceramic, carbon fiber
DC magnetron sputtering coating equipment is usually used for:
Automotive lights, automotive wheels, solar collectors, conductive films, shielding films, ITO glass, glass silver mirrors, plastic products such as chrome, titanium and other metal and metal compound coatings, can also be used to deposit PVD hard film On gears, twist drills, taps, molds
Unbalanced magnetron sputtering coating equipment is usually used for plating various colors, carbon golf clubs on metal, metal and ceramic products
Magnetron sputtering is a kind of PVD technology which can apply different kind of metal coatings on susbtrates with a sputtering cathode. This machine is capable to work with different raw materials such as plastic, metal, ceramic, glass.
Both of batch type and continuous inline sputtering system are available for different applications.
The coatings made by sputtering is good quality than it made by thermal evaporation. Argon gas is required to introduce into the vacuum chamber for the process.
We provide different types of sputtering cathodes: DC sputtering, unbalanced sputtering cathode. We provide the complete machine, also the cathodes which are designed according to your requirements.
Maximum loading size: We design the vacuum chamber size and loading fixture according to customer requirements
Vacuum chamber type: Vertical
Vacuum chamber material: Stainless steel or carbon steel
Applicable substrate material: PC, PET, PP, PE, etc.
PVD technology: DC magnetron sputtering or unbalanced sputtering
Extraction speed: 8min can reach 0.05Pa
Vacuum system: Turbo molecular pump or diffusion pump + roots pump + mechanical pump
Processing cycle: It takes less than 15 minutes to complete the process from substrate placement, sputtering, and removal. It also varies according to different processes.
Reflectivity: 85% or more
Sputtering chamber: High utilization sputtering cathode
Sputtering power type: DC or unbalanced sputtering power
Sputtering materials: Aluminum, copper, titanium, stainless steel, silver, etc. according to customer process requirements
Process gas: Argon, nitrogen, oxygen, acetylene, etc
For more details, please contact us.
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