| After-sales Service: | Engineers Can Be Sent to The Worksite |
|---|---|
| Warranty: | 1 Year |
| Type: | Coating Production Line |
| Coating: | Vacuum Coating |
| Substrate: | Steel |
| Certification: | CE |
| Customization: |
|---|
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Audited Supplier Plastic Titanium Nitride(TiN) Coating PVD Equipment
The equipment is a reasonable structure, coating evenly into good-quality, pumping speed, the cycle of short, high efficiency and easy operation, low energy consumption and performance advantages of stability. Widely used in automotive, audio and various small appliances, computers, clocks and watches, toys, cell phones, reflective Cup, cosmetics, toys and other industries.
| Medium Frequency(MF) Twin Cathodes Magnetron Sputtering |
Unbalanced magnetron sputtering can be come with a cylindrical and planar target. The deposition power efficiency twice as large as that obtained by conventional magnetron sputtering was realized.
| How the sputtering system works |
This technology can be usually used for applying decorative colors onto metal, ceramic and glass items.
| General Process |
· Ar gas which is activated in plasma forms Ar ions.
· The Ar ions sputter out metal atoms from the target.
· Unbalanced magnetic field introduces the Ar ions around the substrate.
· Apply negative voltage on the substrate to attract Ar ions that induce active energy to the metal atoms depositing on the substrate.
· Solid metal films are formed on the substrate.
| Techanical Specifications |
| Model Number | SP-1000 | SP-1200 | SP-1400 | SP-1800 |
| Dimension of vacuum chamber | 1000*1100 | 1200*1400 | 1400*1600 | 1800*2000 |
| (diameter*height) | ||||
| Material of vacuum chamber | Carbon steel, SUS304 or SUS316L | |||
| Quantity of sputtering cathodes | ≥1 sets,MF(medium frequency) unbalanced sputtering system, or rectangle or cylindrical sputtering cathodes | |||
| Pumping system | Turbo molecular pumps or diffusion pump+mechanical pump | |||
| Pumping Time | From atmosphere to 5.0*10-2Pa less than 8 minutes | |||
| Gas distribution System with Mass Flow Controllers | ≥2 sets | |||
| Ultimate Vacuum | 5.0*10-4 Pa | |||
| Working temperature | Room temperature | |||
| Working mode | Automatic or Manual mode, by 10.4(or 15) inches PLC touches screen | |||
| Total Power | 40-100kW | 70-1000kW | ||
| These units you can custom made | 1. Size of vacuum chamber | |||
| 2. Quantity of sputtering cathodes | ||||
| 3. Configurations of pumps | ||||
| 4. Gas distribution system | ||||
| Optional instruments | 1. Coatings thickness monitor | |||
| 2. Leakage detector | ||||
| 3. Arc ion deposition system(not for continuous model) | ||||
| 4. Evaporation system(not for continuous model) | ||||
PS: All the specifications can be customized according to your requests.
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