| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
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HIPIMS Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims Para Sistema De Vacio De Recubrimiento
High Ionization Magnetron Power Supply has coupled high power pulse into DC magnetron sputtering. It delivers not only stable DC magnetron sputtering but also short high power pulse into cathode and plasma. The pulses are of >400A at voltage of 1kV with short duration and low frequency to keep low average output power down to the range of kW while the pulse peak power can be upto the range of MW.
Due to high peak power, the plasma density during the pulses is extremely high that gives very high ionization fraction compared to DC magnetron plasmas as well as it allows for fine control of the sputtered species during deposition.
Advanced Features
High peak power output
High ionization fraction of upto 50%
Effective utilization of cathode/target
Easily adaptable to existing cathode and process
Active arc suppression with stable sputtering process
Adjustable pulse duration and frequency
Good stoichiometric film in reactive deposition
Minimum film defect by droplet - free sputtering
Superior film density and extreme structural conformity
Excellent adhesion and decreased roughness
Technical Specifications of the HIPIMS Power Supply:
| Average Power | 5kW, 10kW, 15kW, 20kW |
| DC Voltage | >700V |
| DC Current | 5A - 30A |
| Pulse Voltage | 200V - 1000V |
| Pulse Current | <=400A |
| Pulse Width | 30us - 300us |
| Pulse Frequency | 30Hz - 300Hz |
| Input Power | 3-phase 380V+/-5%, 50/60Hz |
1. Outside package: Standard marine export polywood case.
2. Inner package: Stretchy film and plastic film for humidity.
3. Wooden box at the bottom of a solid iron socket for easy handling
4. We can package according to your requests.
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