• Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento
  • Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento
  • Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento
  • Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento
  • Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento
  • Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento

Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento

After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year
Type: Coating Production Line
Coating: Powder Coating
Substrate: Steel
Certification: CE
Customization:
Manufacturer/Factory & Trading Company
Gold Member Since 2024

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Hunan, China
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  • Overview
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  • Contact
Overview

Basic Info.

Model NO.
HIPIMS power supply
Condition
New
Output Power
up to 20kw
Output Current
up to 20A
Input Voltage
3-Phase 380V
Output Voltage
DC-Pulse
Transport Package
Standard Export Packing
Specification
Customized
Trademark
HPP
Origin
Hunan, China
HS Code
8543309090
Production Capacity
50 Unit/Units Per Month

Product Description

HIPIMS Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims Para Sistema De Vacio De Recubrimiento

Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento

High Ionization Magnetron Power Supply has coupled high power pulse into DC magnetron sputtering. It delivers not only stable DC magnetron sputtering  but also short high power pulse into cathode and plasma. The pulses are of >400A at voltage of 1kV with short duration and low frequency to keep low average output power down to the range of kW while the pulse peak power can be upto the range of MW.

 

Due to high peak power, the plasma density during the pulses is extremely high that gives very high ionization fraction compared to DC magnetron plasmas as well as it allows for fine control of the sputtered species during deposition.

 

Advanced Features

High peak power output
High ionization fraction of upto 50%
Effective utilization of cathode/target
Easily adaptable to existing cathode and process
Active arc suppression with stable sputtering process
Adjustable pulse duration and frequency
Good stoichiometric film in reactive deposition
Minimum film defect by droplet - free sputtering
Superior film density and extreme structural conformity
Excellent adhesion and decreased roughness

 

Technical Specifications of the HIPIMS Power Supply:

 

Average Power 5kW, 10kW, 15kW, 20kW
DC Voltage >700V
DC Current 5A - 30A
Pulse Voltage 200V - 1000V
Pulse Current <=400A
Pulse Width 30us - 300us
Pulse Frequency 30Hz - 300Hz
Input Power 3-phase 380V+/-5%, 50/60Hz

 

Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento

Packaging & Shipping

Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento

1. Outside package: Standard marine export polywood case.
2. Inner package: Stretchy film and plastic film for humidity.

3. Wooden box at the bottom of a solid iron socket for easy handling
4. We can package according to your requests.

 

Contact

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Hipims Power Supply for PVD Coating Process Vacuum System Fuente De Alimentacion Hipims PARA Sistema De Vacio De Recubrimiento

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Gold Member Since 2024

Suppliers with verified business licenses

Manufacturer/Factory & Trading Company
Number of Employees
10
Year of Establishment
2021-01-12