| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
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Indium Tin Oxide (ITO) magnetron sputtering coating line
ITO (Indium Tin Oxides) as nano-indium tin metal oxide, has good electrical conductivity and transparency, can cut off harmful to the human body electron radiation, ultraviolet and far infrared. Therefore, after spraying on glass, plastic and electronic display screen, in the enhanced conductivity and transparency at the same time cut off the harmful electronic radiation and ultraviolet, infrared. The coating equipment is in the high-quality float glass using vacuum magnetron sputtering technology, twin cathode, IF sputtering technology, and with the international advanced control system, plating SO2 / ITO film, the production process all automatic, continuous The
Technical characteristics of ITO film coating production line
1) Vacuum chamber material using SUS304, vacuum chamber wall for polishing, the outer wall after polishing with beads treatment.
2) between the vacuum chamber with independent door valve - flap valve separated, you can achieve effective partition, stabilize the process gas. At present, our company uses the flap valve design, it is more than the current domestic common flap valve seal better and more durable.
3) transmission using magnetic guidance, to ensure the stability of transmission. The entire production line of the speed of each section using frequency control motor drive, running speed can be adjusted.
4) electrical control system: touch screen and P L C automatic control, man-machine dialogue mode to achieve the system data display, operation and control technical parameters
1) Ultimate vacuum pressure: 6 × 1 0E-4 Pa
2) the average production cycle: according to product identification
3) Substrate size: can be customized according to requirements
4) Film uniformity: ± 3% Advanced mobile magnetic field technology greatly improved target utilization
Segmented heating design, is conducive to process optimization. Products are widely used in liquid crystal display (LCD), touch screen, solar cells, microelectronics ITO conductive film glass, optoelectronics and a variety of optical fields
Structure of the magnetron sputtering coating line
The vacuum coating production line is usually connected by more than three vacuum chambers to form a continuous working vacuum coating machine.
The vacuum coating line is mainly used for film coating on flat glass, acrylic, PC, PET substrates, various metal films, dielectric films, dielectric metal composite films, transparent conductive films and other film applications.
The industries involved in the vacuum coating line include the surface coating of plastic panels and display screens in mobile phones, electronics, home appliances and other industries.
The vacuum coating production line adopts molecular pump or diffusion pump to form advanced design with atmosphere isolation. The equipment uses turbo floating molecular pump to obtain high efficiency isolation, stable pumping speed and uniform gas distribution. In the case of pumping with a diffusion pump, the vacuum pumping rate is high and the equipment production cost is lower.
Vertical magnetron sputtering coating line
Horizontal magnetron sputtering coating line
The company can provide design according to user requirements, provide a full set of equipment, responsible for the process, according to "turnkey" engineering services.
Magnetron sputtering cathodes
Accorinf to different technical requirements of each customers, we can design different types of magnetron sputtering cathodes for the machine. This is the coating system of the machine. You can load different raw material to the cathodes for different coatings.
| Chamber type | Vertical and horizontal method of multi-chamber | |
| Applied material | Glass and Wafer, other plastic, metal materials | |
| Substrate size | Vertical type | 2,200mm x 2,500mm |
| Horizontal type | 1,500mm x 1,800mm | |
| Tact time | 60 sec or less (Static method) 35 sec or less (Dynamic method) | |
| Coating source | Sputter source | Rotary cathode, Planar cathode |
| Thermal source | Crucible, E-beam | |
| Coating material | Metal material | Al, Ti, Cr, Cu, NiCr, Ni, Ag, other metal material |
| Reactive material | TiO2, Nb2O5, SiO2, TIO, SiAlOx, MoOx, other nitride / oxide material | |
| Power supply | DC, Pulse DC, MF | |
| Thickness uniformity | ±10% or less (Static film) ±5% or less (Moving film) | |
| Measuring instrument | Sheet resistance, optic (Transmittance, reflectance, color-difference meter), | |
| plasma emission monitor, RGA | ||
| Household appliances field | Decorative coating on household products and exterior of mobile devices | |
| Energy field | Architectural window glass, solar cell | |
| Other industrial field | Metal thin film and oxide thin film, multi-layered thin film coating based application field | |
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Q1: What is your product, and the max. dimension?
Q2: The size of your processing material, your desired daily production capacity?
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