Precision Sputtering Sources for DC, Mf, and RF Applications High Target Utilization, Uniform Film Deposition, and Long Operating Life
| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
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Basic Info.
- Model NO.
- SP-100
- Type
- Coating Production Line
- Coating
- Vacuum Coating
- Substrate
- Steel
- Certification
- CE
- Condition
- New
- Equipment Name
- High-Performance Magnetron Sputtering Cathodes for
- Technology
- Magnetron Sputtering
- Application
- Functional and Decorative Coating Purposes
- Coating Films
- Tin, Crn, Tialn, Ticn, etc and Metal Coatings
- Coating Cycle Time
- Depends on The Coating Films
- Type of Cathodes
- Planar or Cylindrical
- Transport Package
- Export Standard Packing
- Specification
- Customized
- Trademark
- Hondson VAC
- Origin
- China
- HS Code
- 8543300090
- Production Capacity
- 50 Sets/Year
Product Description
High-Performance Magnetron Sputtering Cathodes For Thin Film Deposition
Our High-Performance Magnetron Sputtering Cathodes are advanced physical vapor deposition (PVD) sources designed for DC, medium frequency (MF), and radio frequency (RF) sputtering processes. These cathodes generate a stable, high-density plasma to deposit high-quality thin films onto glass, wafers, metals, plastics, and other substrates. Available in circular (round) and rectangular (linear) configurations, they are widely used in architectural glass coating, decorative coating, semiconductor manufacturing, solar panel production, display fabrication, and functional film deposition. With optimized magnetic field design, efficient water cooling, and robust construction, our cathodes deliver exceptional target utilization, uniform erosion profiles, and reliable 24/7 operation.
Features
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Optimized Magnetic Field: Balanced and unbalanced magnetron configurations available. Provides high plasma density and uniform target erosion for up to 80 percent target utilization.
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High Deposition Rate: Strong magnetic confinement increases sputtering yield, improving throughput and reducing process time.
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Excellent Film Uniformity: Precision-engineered magnetic array ensures uniform thickness distribution across the substrate, typically within plus or minus 3 percent.
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Efficient Cooling: Integrated water channels with high-flow design prevent target overheating, allowing continuous high-power operation.
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Versatile Power Compatibility: Suitable for DC sputtering of conductive materials, MF dual-cathode for reactive sputtering (oxides, nitrides), and RF sputtering for dielectric targets.
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Easy Target Change: Quick-release target clamping mechanism minimizes downtime. Compatible with planar and rotatable targets depending on model.
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Durable Construction: Made from high-quality stainless steel, copper, and non-magnetic materials with vacuum-compatible seals.
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Wide Size Range: Circular cathodes from 2 inches to 12 inches diameter. Rectangular cathodes from 300 mm to 2000 mm length.
Advantages
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High Target Utilization: Up to 80 percent for planar cathodes and over 90 percent for rotatable designs, significantly reducing material cost.
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Stable Long-Term Operation: Robust cooling and magnetic design prevent arcing and drift, ensuring consistent film quality over hundreds of hours.
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Low Particulate Generation: Smooth erosion profile minimizes nodule formation and particle flaking, improving yield for sensitive applications.
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Customizable Magnetic Profile: We can tailor the magnetic field to match your specific target material and desired erosion pattern.
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Easy Retrofit: Standard flange sizes and mounting patterns compatible with most existing sputtering systems from leading manufacturers.
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Global Support: Technical assistance for installation, optimization, and troubleshooting.
Applications
Our magnetron sputtering cathodes are used in the following thin film deposition processes:
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Architectural Glass Coatings: Low-E (low emissivity) glass, solar control coatings.
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Decorative Coatings: Chrome-like, gold, brass, bronze finishes on plastics, metals, ceramics.
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Optical Coatings: Anti-reflection (AR), high-reflection (HR), beam splitters, filters.
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Semiconductor and Electronics: Barrier layers, seed layers, metallization (Al, Cu, Ti, Ta).
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Solar Energy: Transparent conductive oxides (TCO) such as ITO, AZO for thin-film solar cells.
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Web Coating: Flexible packaging, barrier films (AlOx, SiOx), magnetic media.
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Hard Coatings: Wear-resistant films (CrN, TiN) on tools and components.
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Medical Devices: Biocompatible coatings on implants and instruments.
Why Choose Our Magnetron Sputtering Cathodes
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Proven Performance: Thousands of cathodes installed worldwide in glass coating, electronics, and solar industries.
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Cost-Effective: Competitive pricing compared to OEM brands with equal or better quality and lifespan.
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Fast Delivery: Standard sizes in stock; custom orders shipped within 4 to 6 weeks.
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Complete Technical Documentation: Includes installation manual, magnetic field mapping, cooling specifications, and power supply integration guide.
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Custom Engineering: We can design cathodes to fit non-standard chambers or special target geometries.
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Warranty: 12 months against manufacturing defects.
Vacuum magnetron sputtering technique is the use of the female, bipolar electrode surface with the magnetic field of the electron in the cathode surface drift, by setting the target surface electric field perpendicular to the magnetic field, the electron increases stroke, increase the rate of ionization of the gas, while the high-energy particles gas and lose energy after the collision and so lower substrate temperature, complete coating on a non-temperature resistant material. Vacuum magnetron sputtering coating has the following advantages:
(1) The thickness of the coating can be controlled, according to the needs of people plating film, and the coating can be repeated, but also to break the limit of the prior art, to obtain a uniform film thickness on a large surface;
(2) Film obtained by this technique with strong adhesion;
(3) This technique can be prepared a special film material, according to their needs while sputtering hybrid film, compound film;
(4) high purity film.
We provide customized options for the magnetron sputtering coating cathodes.
Sputtering cathodes in the PVD coating machine:
Company profile:
Xiangtan Hondson Coating Technology Co., Ltd., which is in the field of metal coatings, specializes in PVD (Physical Vapor Deposition) area. We produce vacuum aluminum evaporation machine, magnetron sputtering machine and arc deposition machine.
Xiangtan Hondson Coating Technology Co., Ltd. has enjoyed conspicuous success in the design, manufacture of PVD Vacuum Coating Machines. We are specialized in innovative PVD technology, as well as equipment for various applications, including electronics, thin film deposition, vacuum coated glass, automotive, plastic decorations, harden protective coatings on tools, molds, drills, knives, etc.
Our high quality Vacuum Coaters are sold to foreign and domestic markets and win their praise and good graces. We are happy to establish business relationship with customers all over the world. If you are interested in our products, or you are looking for cooperation partners in China for Vacuum Coating Equipment, welcome to contact us for further information.
Every machine is designed according to customer's real requests.
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