Compact in-Line Magnetron Sputtering Coater for Small to Medium Batch Production Uniform Thin Films on Glass, Wafers, Metals, and Plastics
| Customization: | Available |
|---|---|
| After-sales Service: | Engineers Can Be Sent to The Worksite |
| Warranty: | 1 Year |
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Basic Info.
- Model NO.
- SP-4000
- Type
- Coating Production Line
- Coating
- Vacuum Coating
- Substrate
- Glass
- Certification
- CE
- Condition
- New
- Equipment Name
- Small Inline Sputtering Machine Vertical Side Sput
- Technology
- DC or MID-Frequency Magnetron Sputtering
- Application
- Functional and Decorative Coating Purposes
- Coating Films
- Metal Coating, Ar, ITO Coatings, etc
- Coating Cycle Time
- Depends on The Coating Films
- Pump System
- Turbo Molecular Pump+Roots Pump+Mechanical Pump
- Control
- PLC Control
- Optional
- Linear Ion Source
- Optional Pumping System
- Diffusion Pump+Roots Pump+Mechanical Pump
- Transport Package
- Export Standard Packing
- Specification
- Customized
- Trademark
- Hondson VAC
- Origin
- China
- HS Code
- 8543300090
- Production Capacity
- 10 Sets/Year
Product Description
Small Inline Sputtering Machine Vertical Side Sputtering System
Small Inline Sputtering Machine is a vertical sputtering system designed for high-quality thin film deposition in a compact, production-friendly footprint. Unlike batch coaters, this inline (in-line) configuration allows substrates to move continuously or semi-continuously through separate process chambers, ensuring excellent film uniformity, high throughput, and minimal particle contamination. The vertical substrate orientation reduces floor space requirements and prevents dust settlement. Ideal for R&D, pilot production, and small to medium industrial manufacturing, this system handles applications such as transparent conductive oxides (TCO), metal electrodes, anti-reflection coatings, decorative layers, and barrier films on glass, silicon wafers, metals, and heat-sensitive polymer films.
Features
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Compact Inline Design: Vertical transport of substrates through load lock, sputtering, and unload chambers. Minimal footprint suitable for laboratories and limited production floors.
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High Uniformity: Linear magnetron sputtering cathodes with adjustable magnetic field ensure thickness uniformity of plus or minus 3 percent across the substrate.
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Fast Cycle Time: Load lock allows rapid pump-down and substrate exchange without venting the main process chamber, increasing throughput.
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Multiple Cathode Configurations: Accommodates 2 to 6 magnetron sputtering cathodes (DC, pulsed DC, or MF). Capable of co-sputtering or sequential deposition for multilayer films.
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Substrate Size Flexibility: Designed for substrates from 100 mm x 100 mm up to 500 mm x 500 mm or custom sizes.
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Vertical Substrate Holder: Substrates are held vertically, reducing particle contamination and simplifying automation.
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Fully Automated Control: PLC and HMI touchscreen with recipe management for gas flow, cathode power, substrate speed, and process pressure. Data logging and remote monitoring optional.
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Clean and Safe: No liquid chemicals, closed-loop cooling, and fully interlocked safety system.
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Versatile Process Capabilities: Reactive sputtering for oxides and nitrides (e.g., ITO, AZO, TiO2, SiO2, Si3N4) and metallic sputtering (Al, Cu, Ti, Cr, Ag).
Applications
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Research and Development: Thin film material exploration, process optimization, small batch prototyping.
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Display and Touch Panel: ITO (indium tin oxide) transparent electrodes on glass or polymer.
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Solar Cell Manufacturing: TCO layers (AZO, ITO) for thin-film or perovskite solar cells.
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Optical Coatings: Anti-reflection (AR) coatings on glass or plastic lenses, mirrors, beam splitters.
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Semiconductor: Metal seed layers, diffusion barriers (Ti, TiN, Ta, TaN) on wafers.
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Decorative Coatings: Uniform metallic finishes on small parts, jewelry, or panels.
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Barrier Films: AlOx or SiOx on flexible substrates for packaging.
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Sensor and MEMS: Thin metal or dielectric films for microdevices.
Why Choose Our Small Inline Vertical Sputtering System
-
Space Saving: Vertical inline design reduces footprint compared to horizontal batch coaters.
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Production Ready: Small but scalable; suitable for pilot lines moving to full production.
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Excellent Uniformity: Linear cathodes and optimized substrate movement ensure repeatable, high-quality films.
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Low Maintenance: Easy access to cathodes, targets, and vacuum components. Quick target change design.
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Energy Efficient: Turbo pump with automatic back-to-standby reduces power consumption.
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Flexible: Switch between different target materials and process gases quickly.
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Global Support: Installation, training, and remote diagnostics included. CE compliant.
Vacuum magnetron sputtering technique is the use of the female, bipolar electrode surface with the magnetic field of the electron in the cathode surface drift, by setting the target surface electric field perpendicular to the magnetic field, the electron increases stroke, increase the rate of ionization of the gas, while the high-energy particles gas and lose energy after the collision and so lower substrate temperature, complete coating on a non-temperature resistant material. Vacuum magnetron sputtering coating has the following advantages:
(1) The thickness of the coating can be controlled, according to the needs of people plating film, and the coating can be repeated, but also to break the limit of the prior art, to obtain a uniform film thickness on a large surface;
(2) Film obtained by this technique with strong adhesion;
(3) This technique can be prepared a special film material, according to their needs while sputtering hybrid film, compound film;
(4) high purity film.
We provide customized options for the machine, such as the different vacuum pumping systems, gas distribution system, coating system, etc.
Main Specifications:
| Parts Name | Vacuum magnetron sputtering system |
| * Main application | Mirror making; ITO conductive glass, Low-E glass and sun reflecting glass; Solar cells; other thin film coating; Pilot coating engineering. |
| * Custom made(Vertical or Horizontal chamber)working chamber in Rectangular or cylindrical | Single layer or with cooling jacket |
| * Base material of body | Carbon steel or stainless steel |
| * Custom made carousel/rack/jigs | √ |
| * High vacuum system based on oil diffusion pumps or molecular pump/MAG molecular pumps, roots/booser pump and mechanical pumps; | √ |
| * Electrical controlling center with PLC screen, automatic and manual work modes available; | √ |
| * Tungsten&aluminum filament evaporation unit | × |
| * Magnetron sputtering cathodes in Rectangular or cylindrical | √ |
| * Arc deposition unit | × |
| Notice: This is a kind of custom made machine, the three above unit can be united in the same machine for multi-functional applications. | |
| * Power support | Magnetron sputtering source |
| * Gas feeding system | The quantity will be provided according to the needs. |
| * Cool water | For pumps and cathodes, power sources |
| * Compressed air needed | √ |
Company profile:
Xiangtan Hondson Coating Technology Co., Ltd., which is in the field of metal coatings, specializes in PVD (Physical Vapor Deposition) area. We produce vacuum aluminum evaporation machine, magnetron sputtering machine and arc deposition machine.
Xiangtan Hondson Coating Technology Co., Ltd. has enjoyed conspicuous success in the design, manufacture of PVD Vacuum Coating Machines. We are specialized in innovative PVD technology, as well as equipment for various applications, including electronics, thin film deposition, vacuum coated glass, automotive, plastic decorations, harden protective coatings on tools, molds, drills, knives, etc.
Our high quality Vacuum Coaters are sold to foreign and domestic markets and win their praise and good graces. We are happy to establish business relationship with customers all over the world. If you are interested in our products, or you are looking for cooperation partners in China for Vacuum Coating Equipment, welcome to contact us for further information.
Every machine is designed according to customer's real requests.
For more details, please contact us.
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