Multi-arc ion plating cathode arc target for vacuum coating machine is introduced
The multi-arc ion plated cathode arc target for vacuum coater is a key component for forming thin films on substrate materials by physical vapor deposition (PVD) under vacuum. The main function of this target head is to vaporize the target material and form plasma through an arc discharge, and then deposit the required film on the substrate.
The working principle of the multi-arc ion plated cathode arc head is based on the arc discharge phenomenon. By applying a high voltage between the target and the anode, the surface of the target forms an arc, thus heating the target to the evaporation state. In this process, target atoms or molecules are ionized into plasmas, which then move in a vacuum environment and deposit towards the substrate, forming the desired film.
This target head has the following features and advantages:
High deposition rate: Due to the rapid heating and evaporation process of arc discharge, multi-arc ion plating technology usually has a high deposition rate and is suitable for large-scale production.
Excellent film properties: By precisely controlling deposition parameters, films with excellent physical and chemical properties can be obtained, such as hardness, wear resistance, corrosion resistance, etc.
Wide range of applications: multi-arc ion plating technology is widely used in tool manufacturing, mold manufacturing, decoration manufacturing, aerospace and other fields to improve surface performance and extend service life.
It should be noted that the design and manufacture of multi-arc ion plating cathode arc head need to take into account a variety of factors, including target selection, arc discharge control, vacuum system design, etc., to ensure the stability of the deposition process and the controllability of the film quality.